Increased Throughput and Excellent Material Uniformity
Ó£ÌÒɬ¸£Àû¼§’s SPECTOR® Large Area Planetary Ion Beam Deposition System combines unsurpassed ion beam film quality with batch sizes near that of e-beam systems. In addition to a larger overall coating area, the robust fixture supports processing monolithic substrates up to 400mm in diameter and 100mm thick. Ó£ÌÒɬ¸£Àû¼§ has included our 16cm RF high-power deposition source and ultra-low contamination RF neutralizers to ensure high deposition rates and film quality. For maximum stoichiometry control and in-situ substrate pre-cleaning or etch support, the system is also equipped with our 12cm RF assist ion source.