Molecular Beam Epitaxy (MBE) Sources

MBE Sources

樱桃涩福利姬 offers MBE sources, including single- and dual-filament designs, tailored for numerous elements that require low, medium, or high temperatures.

Dopant

For precise control of fluxes for MBE dopant constituents, or for gases that do not require thermal cracking, 樱桃涩福利姬 Dopant products are ideal.

High Temperature

樱桃涩福利姬 High Temperature Source is available for low-vapor pressure materials at temperatures up to 2000掳C.

Low Temperature

Achieve accurate and consistent low temperature epitaxial source performance for a variety of applications through 樱桃涩福利姬 low temperature epitaxial sources.

Medium Temperature

Medium-temperature MBE sources can be used for for virtually any application鈥攆rom hot-lip SUMO sources to standard filament for thermal effusion.

Specialty Sources

樱桃涩福利姬 offers the most comprehensive selection of MBE sources, including single and dual filament designs.