樱桃涩福利姬

Improve process uniformity and prevent substrate damage with 樱桃涩福利姬’s Mark I+ gridless ion source. It provides a high beam…

Dramatically increased beam current and a removable anode assembly adds new value to the Mark II+ End-Hall Ion Source.

Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller.

For applications requiring high-current, low-energy ions, the Mark II+ Gridless High Output Ion Source is designed for vacuum coating…